SNUEI

Fabrication of Micro-Patterned Chip with Controlled Thickness for High-Throughput Cryogenic Electron Microscopy

2022 · Journal of Visualized Experiments

저자

Min‐Ho Kang, Minyoung Lee, Sungsu Kang, 박정원 (Jungwon Park)

연구주제

Advanced Electron Microscopy Techniques and Applications · Advancements in Photolithography Techniques

NTIS 과학기술표준분류

에너지/자원만에너지·환경·원자력 확장

지원 과제·AI 키워드로 잡을 근거가 없어 분류하지 않았다.

AI 연구 키워드·방법

cryo electron microscopy grid silicon nitride membrane

극저온 전자현미경(Cryo-EM)

키워드 (OpenAlex)

silicon nitride thin films inorganic nanomaterials

초록

A major limitation for the efficient and high-throughput structure analysis of biomolecules using cryogenic electron microscopy (cryo-EM) is the difficulty of preparing cryo-EM samples with controlled ice thickness at the nanoscale. The silicon (Si)-based chip, which has a regular array of micro-holes with graphene oxide (GO) window patterned on a thickness-controlled silicon nitride (SixNy) film, has been developed by applying microelectromechanical system (MEMS) techniques. UV photolithography, chemical vapor deposition, wet and dry etching of the thin film, and drop-casting of 2D nanosheet materials were used for mass-production of the micro-patterned chips with GO windows. The depth of the micro-holes is regulated to control the ice thickness on-demand, depending on the size of the specimen for cryo-EM analysis. The favorable affinity of GO toward biomolecules concentrates the biomol…

이 논문을 지원한 국가R&D 과제 (NTIS 성과)

NTIS 성과DB(2020–24)에서 DOI 매칭 없음

인접 그래프

노드 hover = 이웃 강조 · 1회 클릭 = 고정 · 고정된 노드 다시 클릭 = 페이지 이동

이 문서와 연결된 페이지

교수 1

박정원

연구주제 1

Advanced Electron Microscopy Techniques and Applications

방법 1

극저온 전자현미경(Cryo-EM)