Low‐Temperature Atomic Metal Deposition for an Efficient Dual‐Site Incorporated Photocatalyst

Abstract A universal, low‐temperature atomic metal deposition (LTAMD) strategy is herein reported for synthesis of atomically dispersed metal catalysts (ADMCs) using metal carbonyl precursors. This scalable approach enables the fabrication of diverse ADMCs with various transition metals, including W, Cr, Mn, Fe, Co, Mo, Ru, Rh, and Re on oxide and carbon‐based supports. Tungsten‐incorporated TiO 2 exhibits exceptional photocatalytic benzene oxidation activity, attributed to the generation of surface oxygen vacancies with Ti 3+ , which act as active reduction sites under aerobic conditions, facilitating the formation of reduced oxygen intermediates. It is demonstrated that tungsten plays a crucial role in stabilizing these oxygen vacancies and promoting electron‐hole separation by accommodating photogenerated holes and activating the C─H bond of benzene. Leveraging dual‐site photocatalysi…