X-ray absorption spectroscopy elucidates the impact of structural disorder on electron mobility in amorphous zinc-tin-oxide thin films
2014 · Applied Physics Letters
저자
Sin Cheng Siah, Sang Woon Lee, 이윤석 (Yun Seog Lee), Jaeyeong Heo, Tomohiro Shibata, Carlo U. Segre, Roy Gerald Gordon, Tonio Buonassisi
연구주제
Thin-Film Transistor Technologies · Semiconductor materials and devices
NTIS 과학기술표준분류
에너지/자원만에너지·환경·원자력 확장
가장 가까운 분류(정보/통신 > 정보통신 모듈 및 부품 > 이동통신 모듈/부품)가 에너지·환경·원자력 확장 범위 밖이다.
AI 연구 키워드·방법
amorphous zinc tin oxide 전자 이동도 구조적 무질서
키워드 (OpenAlex)
amorphous zinc tin oxide structural disorder electron mobility thin films atomic layer deposition Zn K-edge Sn K-edge EXAFS
초록
We investigate the correlation between the atomic structures of amorphous zinc-tin-oxide (a-ZTO) thin films grown by atomic layer deposition (ALD) and their electronic transport properties. We perform synchrotron-based X-ray absorption spectroscopy at the K-edges of Zn and Sn with varying [Zn]/[Sn] compositions in a-ZTO thin films. In extended X-ray absorption fine structure (EXAFS) measurements, signal attenuation from higher-order shells confirms the amorphous structure of a-ZTO thin films. Both quantitative EXAFS modeling and X-ray absorption near edge spectroscopy (XANES) reveal that structural disorder around Zn atoms increases with increasing [Sn]. Field- and Hall-effect mobilities are observed to decrease with increasing structural disorder around Zn atoms, suggesting that the degradation in electron mobility may be correlated with structural changes.
이 논문을 지원한 국가R&D 과제 (NTIS 성과)
NTIS 성과DB(2020–24)에서 DOI 매칭 없음
인접 그래프
노드 hover = 이웃 강조 · 1회 클릭 = 고정 · 고정된 노드 다시 클릭 = 페이지 이동
이 문서와 연결된 페이지
교수 1
연구주제 1
Thin-Film Transistor Technologies